Investigation of Physical and Chemical Interactions During Etching of Silicon in Dual Frequency Capacitively Coupled HBr/NF3 Gas Discharges
- ISBN 13 : 3839138442
- ISBN 10 : 9783839138441
- Judul : Investigation of Physical and Chemical Interactions During Etching of Silicon in Dual Frequency Capacitively Coupled HBr/NF3 Gas Discharges
- Pengarang : Marco Reinicke,
- Penerbit : BoD – Books on Demand
- Bahasa : en
- Tahun : 2009
- Halaman : 271
- Halaman : 271
- Google Book : http://books.google.co.id/books?id=IbkMw4F2EK4C&dq=intitle:HBR&hl=&source=gbs_api
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